Browsing by author "Das, Sayantan"
Now showing items 1-20 of 23
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28nm-pitch Ru interconnects patterned with 0.33NA-EUV single exposure
Das, Sayantan; Kisson, Nicola; Mahmud Ul Hasan, Hasan MD; Rynders, Luc; Kljucar, Luka; Halder, Sandip; Leray, Philippe; Dusa, Mircea; Rio, David; Mohsen, Mahmoud; Spence, Chris; De Poortere, Etienne (2021) -
Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling
Wei, Chih-, I; Kang, Seulki; Das, Sayantan; Oya, Masahiro; Okamoto, Yosuke; Maruyama, Kotaro; Fenger, Germain; Latypov, Azat; Kusnadi, Ir; Khaira, Gurdaman; Yamazaki, Yuichiro; Gillijns, Werner; Halder, Sandip; Lorusso, Gian (2023) -
Better prediction on patterning failure mode with hotspot aware OPC modeling
Wei, Chih-I; Wu, Stewart; Deng, Yunfei; Khaira, Gurdaman; Kusnadi, I.; Fenger, G.; Kang, S.; Okamoto, Y.; Maruyama, K.; Yamaszaki, Y.; Das, Sayantan; Halder, Sandip; Gillijns, Werner; Lorusso, Gian (2021) -
Deep learning-based defect detection using large FOV SEM for 28 nm pitch BEOL layer patterned with 0.33NA single exposure EUV
Das, Sayantan; Sah, Kaushik; Liang, Ardis; Roy, Hemanta; Tran, Kha; Babu, Binesh; Hegde, Arjun; Cross, Andrew; Leray, Philippe; Halder, Sandip (2021) -
Defect characterization of EUV Self-Aligned Litho-Etch Litho-Etch (SALELE) patterning scheme for advanced nodes
Sah, Kaushik; Cross, Andrew; Das, Sayantan; Blanco, Victor; Kljucar, Luka; Halder, Sandip; Leray, Philippe (2021) -
Defect detection and classification on imec iN5 node BEoL test vehicle with multibeam scanning electron microscope
Neumann, Jens Timo; Srikantha, Abhilash; Huethwohl, Philipp; Lee, Keumsil; William, B. James; Korb, Thomas; Foca, Eugen; Garbowski, Tomasz; Boecker, Daniel; Das, Sayantan; Halder, Sandip (2023) -
Defect detection and classification on imec iN5 node BEoL test vehicle with MultiSEM
Neumann, Jens Timo; Srikantha, Abhilash; Huthwohl, Philipp; Lee, Keumsil; William, James B.; Korb, Thomas; Foca, Eugen; Garbowski, Tomasz; Boecker, Daniel; Das, Sayantan; Halder, Sandip (2022) -
E-beam metrology-based EUVL aberration monitoring
Kang, Seulki; Miura, Yuji; Maruyama, Kotaro; Yamazaki, Yuichiro; Wei, Chih-, I; Maguire, Ethan; Fenger, Germain; De Bisschop, Peter; Das, Sayantan; Halder, Sandip; Lorusso, Gian (2022) -
EUV based multi-patterning schemes for advanced DRAM nodes
Das, Sayantan; Sah, Kaushik; Fallica, Roberto; Chen, Zhijin; Halder, Sandip; Cross, Andrew; De Simone, Danilo; Treska, Fergo; Leray, Philippe; Kim, Ryan Ryoung han; Maguire, Ethan; Wei, Chih-, I; Fenger, Germain; Lafferty, Neal; Lee, Jeonghoon (2022) -
In-device high resolution and high throughput optical metrology for process development and monitoring
Sah, Kaushik; Li, Shifang; Das, Sayantan; Halder, Sandip; Cross, Andrew (2020) -
iN5 EUV Single Expose Patterning Evaluation for Via Layers
Das, Argho; Blanco, Victor; Das, Sayantan; Kissoon, Nicola; Halder, Sandip; Dusa, Mircea (2021) -
Investigating metal oxide resists for patterning 28-nm pitch structures using single exposure extreme ultraviolet: defectivity, electrical test, and voltage contrast study
Sarkar, Sujan Kumar; Das, Sayantan; Blanco, Victor; Leray, Philippe; Halder, Sandip (2022) -
Low loss high refractive index niobium oxide waveguide platform for visible light applications
Lodewijks, Kristof; Jayachandran, Suseendran; Kongnyuy, Tangla David; Lenci, Silvia; Das, Sayantan; Van Dorpe, Pol; Humbert, Aurelie; Jansen, Roelof; Severi, Simone; Rottenberg, Xavier (2018-06) -
Massive e-beam metrology and inspection for analysis of EUV stochastic defect
Kang, Seulki; Maruyama, K.; Yamazaki, Z.; De Simone, Danilo; Rincon Delgadillo, Paulina; Frommhold, Andreas; Lorusso, Gian; Das, Sayantan; Halder, Sandip; Leray, Philippe (2021) -
Massive metrology for process development and monitoring applications
Sah, Kaushik; Das, Sayantan; Li, S.; Beral, C.; Cross, A.; Halder, Sandip (2020) -
Massive metrology of 2D logic patterns on BEOL EUVL
Das, Sayantan; Kang, S.; Halder, Sandip; Maruyama, K.; Leray, Philippe; Yamazaki, Y. (2020) -
Privacy preserving machine learning for process control
Verachtert, Wilfried; Ashby, Tom; Chakroun, Imen; Wuyts, Roel; Das, Sayantan; Halder, Sandip; Leray, Philippe (2021) -
Realizing more accurate OPC models by utilizing SEM contours
Wei, C.; Sejpal, R.; Deng, Y.; Kusnadi, I.; Fenger, G.; Oya, M.; Okamoto, Y.; Maruyama, K.; Yamazaki, Y.; Das, Sayantan; Halder, Sandip; Gillijns, Werner (2020) -
Scatterometry solutions for 14nm half-pitch BEOL layers patterned by EUV single exposure
Das, Sayantan; Hung, Joey; Halder, Sandip; Koret, Roy; Turovets, Igor; Charley, Anne-Laure; Leray, Philippe (2021) -
Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing
Sah, Kaushik; Cross, Andrew; Das, Sayantan; Fallica, Roberto; Lee, Jeonghoon; Kim, Ryan Ryoung han; Halder, Sandip; Maguire, Ethan; Armeanu, Ana-Maria; Sears, Monica; Lafferty, Neal; Liubich, Vlad; Wei, Chih-, I; Fenger, Germain (2022)