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E-beam metrology-based EUVL aberration monitoring

dc.contributor.authorKang, Seulki
dc.contributor.authorMiura, Yuji
dc.contributor.authorMaruyama, Kotaro
dc.contributor.authorYamazaki, Yuichiro
dc.contributor.authorWei, Chih-, I
dc.contributor.authorMaguire, Ethan
dc.contributor.authorFenger, Germain
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorDas, Sayantan
dc.contributor.authorHalder, Sandip
dc.contributor.authorLorusso, Gian
dc.date.accessioned2023-06-02T10:22:28Z
dc.date.available2022-09-08T02:39:00Z
dc.date.available2023-06-02T10:22:28Z
dc.date.issued2022
dc.identifier.isbn978-1-5106-4981-1
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000844549800033
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40382.2
dc.sourceWOS
dc.titleE-beam metrology-based EUVL aberration monitoring
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorDas, Sayantan
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorLorusso, Gian
dc.contributor.orcidimecDe Bisschop, Peter::0000-0002-8297-5076
dc.contributor.orcidimecDas, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.identifier.doi10.1117/12.2615955
dc.identifier.eisbn978-1-5106-4982-8
dc.source.numberofpages8
dc.source.peerreviewyes
dc.source.beginpage120530Z
dc.source.conferenceConference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference
dc.source.conferencedateFEB 24-MAY 27, 2022
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.volume12053
imec.availabilityPublished - imec


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220.500.12860/40382.2*2023-06-02T10:21:27Zvalidation by library/open access desk
120.500.12860/403822022-09-08T02:39:00Z

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