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Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer
Publication:
Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer
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Date
2018
Proceedings Paper
https://doi.org/10.1117/12.2306282
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39769.pdf
4.13 MB
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Constantoudis, Vassilios
;
Papavieros, George
;
Lorusso, Gian
;
Rutigliani, Vito
;
Van Roey, Frieda
;
Gogolides, Evangelos
Journal
Proceedings of SPIE; Vol. 10589
Abstract
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Views
1926
since deposited on 2021-10-25
2
last month
2
last week
Acq. date: 2025-12-10
Citations