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Computational nanometrology of line-edge roughness: noise effectd, cross-line correlations and the role of etch transfer
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Authors
Constantoudis, Vassilios
;
Papavieros, George
;
Lorusso, Gian
;
Rutigliani, Vito
;
Van Roey, Frieda
;
Gogolides, Evangelos
Conference
Advanced Etch Technology for Nanopatterning VII
Title
Computational nanometrology of line-edge roughness: noise effectd, cross-line correlations and the role of etch transfer
Publication type
Proceedings paper
Embargo date
9999-12-31
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