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Computational nanometrology of line-edge roughness: noise effectd, cross-line correlations and the role of etch transfer

Date

2018
Proceedings Paper
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dc.contributor.authorConstantoudis, Vassilios
dc.contributor.authorPapavieros, George
dc.contributor.authorLorusso, Gian
dc.contributor.authorRutigliani, Vito
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorGogolides, Evangelos
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorVan Roey, Frieda
dc.date.accessioned2021-10-25T17:25:06Z
dc.date.available2021-10-25T17:25:06Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30458
dc.identifier.urlhttps://doi.org/10.1117/12.2306282
dc.source.beginpage105890Y
dc.source.conferenceAdvanced Etch Technology for Nanopatterning VII
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.title

Computational nanometrology of line-edge roughness: noise effectd, cross-line correlations and the role of etch transfer

dc.typeProceedings paper
dspace.entity.typePublication
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