Applying design-based metrology for calibrating an OPC model for FinFET pattering

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Vandeweyer, Tom; Lorusso, Gian; Delvaux, Christie; De Backer, Johan; Jandhyala, Radhika; Azordegan, Amir; Abott, Gordon; Kaliblotzky, Zeev; Ercken, Monique
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Applying design-based metrology for calibrating an OPC model for FinFET pattering
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Proceedings paper
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