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Applying design-based metrology for calibrating an OPC model for FinFET pattering
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Applying design-based metrology for calibrating an OPC model for FinFET pattering
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Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vandeweyer, Tom
;
Lorusso, Gian
;
Delvaux, Christie
;
De Backer, Johan
;
Jandhyala, Radhika
;
Azordegan, Amir
;
Abott, Gordon
;
Kaliblotzky, Zeev
;
Ercken, Monique
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Views
2000
since deposited on 2021-10-16
1
last month
1
last week
Acq. date: 2025-12-15
Citations