Authors

Humphris, Andrew; Moussa, Alain; Dusa, Mircea; Charley, Anne-Laure; Newman, Ellis; Goulden, Jenny; Feng, Lei; Bevis, Christopher

Conference

Metrology, Inspection, and Process Control for Microlithography XXXIV

Title

The application of a Rapid Probe Microscope (RPM) for investigating 1D and 2D structures from EUV lithography

Publication type

Proceedings paper