dc.contributor.author | Mack, Chris A. | |
dc.contributor.author | Yannuzzi, Jonathan | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | Zidan, Mohamed | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Weldeslassie, Ataklti | |
dc.contributor.author | Vandenbroeck, Nadia | |
dc.contributor.author | Foubert, Philippe | |
dc.contributor.author | Beral, Christophe | |
dc.contributor.author | Charley, Anne-Laure | |
dc.date.accessioned | 2024-03-11T15:55:51Z | |
dc.date.available | 2024-01-09T17:15:04Z | |
dc.date.available | 2024-03-11T15:55:51Z | |
dc.date.issued | 2023 | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:001122013500014 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43369.2 | |
dc.source | WOS | |
dc.title | Probabilistic process window: a new approach to focus-exposure analysis | |
dc.type | Journal article | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.imecauthor | Zidan, Mohamed | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Weldeslassie, Ataklti | |
dc.contributor.imecauthor | Vandenbroeck, Nadia | |
dc.contributor.imecauthor | Foubert, Philippe | |
dc.contributor.imecauthor | Beral, Christophe | |
dc.contributor.imecauthor | Charley, Anne-Laure | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | Beral, Christophe::0000-0003-1356-9186 | |
dc.contributor.orcidimec | Charley, Anne-Laure::0000-0003-4745-0167 | |
dc.contributor.orcidimec | Lorusso, Gian::0000-0003-3498-5082 | |
dc.identifier.doi | 10.1117/1.JMM.22.2.021007 | |
dc.source.numberofpages | 11 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 021007 | |
dc.source.endpage | N/A | |
dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
dc.source.issue | 2 | |
dc.source.volume | 22 | |
imec.availability | Published - imec | |