Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100

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Authors
Goethals, Mieke; Van Roey, Frieda; Hosokawa, Kohei; Hoefnagels, Rik; Niroomand, Ardavan; Foubert, Philippe
Conference
International Symposium on Extreme Ultraviolet Lithography - EUVL
Title
Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100
Publication type
Oral presentation
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