Publication:

Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100

Date

2012
Presentation
Simple item page Full metadata Statistics
 
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorHosokawa, Kohei
dc.contributor.authorHoefnagels, Rik
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorFoubert, Philippe
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorHoefnagels, Rik
dc.contributor.imecauthorFoubert, Philippe
dc.date.accessioned2021-10-20T11:14:24Z
dc.date.available2021-10-20T11:14:24Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20731
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate30/09/2012
dc.source.conferencelocationBrussel Belgium
dc.title

Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100

dc.typeOral presentation
dspace.entity.typePublication
Files
Publication available in collections:
Presentations