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Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography
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Authors
Rathore, Ashish
;
Cipriani, Maicol
;
Huang, Ching-Chung
;
Amiaud, Lionel
;
Dablemont, Celine
;
Lafosse, Anne
;
Ingolfsson, Oddur
;
De Simone, Danilo
;
De Gendt, Stefan
DOI
10.1039/d1cp00065a
ISSN
1463-9076
PMID
MEDLINE:33885061
Issue
15
Journal
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
Volume
23
Title
Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography
Publication type
Journal article
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2
20.500.12860/38012.2
*
2023-01-19T12:35:07Z
validation by library/open access desk
1
20.500.12860/38012
2021-11-02T16:02:52Z
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