Browsing by author "Rathore, Ashish"
Now showing items 1-8 of 8
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Development of main chain scission type photoresists for EUV lithography
Shirotori, Akihide; Vesters, Yannick; Hoshino, Manabu; Rathore, Ashish; De Simone, Danilo; Vandenberghe, Geert; Matsumoto, Hirokazu (2019) -
Effect of molecular weight on the EUV-printability of main chain scission type polymers
Rathore, Ashish; Pollentier, Ivan; Singh, Harpreet; Fallica, Roberto; De Simone, Danilo; De Gendt, Stefan (2020) -
Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography
Rathore, Ashish; Cipriani, Maicol; Huang, Ching-Chung; Amiaud, Lionel; Dablemont, Celine; Lafosse, Anne; Ingolfsson, Oddur; De Simone, Danilo; De Gendt, Stefan (2021) -
Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems
Rathore, Ashish; Pollentier, Ivan; Cipriani, Maicol; Singh, Harpreet; De Simone, Danilo; Ingolfsson, Oddur; De Gendt, Stefan (2021) -
Feasibility of unzipping polymer polyphthalaldehyde for extreme ultraviolet lithography
Rathore, Ashish; Pollentier, Ivan; Kumar, Sunkuru S.; De Simone, Danilo; De Gendt, Stefan (2021) -
Improved resolution with main chain scission resists for EUV lithography
Shirotori, Akihide; Hoshino, Manabu; Rathore, Ashish; Fu, Yeh Sin; De Simone, Danilo; Vandenberghe, Geert; Matsumoto, Hirokazu (2022) -
Model-driven controlled alteration of nanopillar cap architecture reveals its effects on bactericidal activity
Zahir, Taiyeb; Pesek, Jiri; Franke, Sabine; Van Pee, Jasper; Rathore, Ashish; Smeets, Bart; Ramon, Herman; Xu, XiuMei; Fauvart, Maarten; Michiels, Jan (2020) -
To bake or not to bake... : the role of prebake in the EUV resist process
Pollentier, Ivan; Rathore, Ashish; Gupta, Mihir; De Simone, Danilo; Suh, Hyo Seon (2022-05-25)