Development on main chain scission resists for high-NA EUV lithography

Thumbnail
Metadata
Show full item record
Authors
Shirotori, Akihide; Hoshino, Manabu; Fujimura, Makoto; Yeh, Sin Fu; Suh, Hyo Seon; De Simone, Danilo; Vandenberghe, Geert; Sanuki, Hideaki
DOI
10.1117/12.2657506
EISBN
978-1-5106-6104-2
ISBN
978-1-5106-6103-5
ISSN
0277-786X
Conference
Conference on Advances in Patterning Materials and Processes XL
Journal
Proceedings of SPIE
Volume
12498
Title
Development on main chain scission resists for high-NA EUV lithography
Publication type
Proceedings paper
Collections

Version history

VersionItemDateSummary
220.500.12860/42236.2*2024-04-08T11:53:50Zvalidation by library/open access desk
120.500.12860/422362023-07-28T17:39:56Z

*Selected version