Browsing by author "Suh, Hyo Seon"
Now showing items 1-20 of 26
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Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers
Fallica, Roberto; Chen, Steven; De Simone, Danilo; Suh, Hyo Seon (2022) -
Defect mitigation in sub-20 nm patterning with high-chi, silicon containing block copolymers
Doise, Jan; Mannaert, Geert; Suh, Hyo Seon; Rincon Delgadillo, Paulina; Vandenberghe, Geert; Willson, C. Grant; Ellison, Christopher J. (2018) -
Development of high-chi directed self-assembly process based on key learning from PS-b-PMMA system
Suh, Hyo Seon; Mannaert, Geert; Vandenbroeck, Nadia; Doise, Jan (2021) -
Development on main chain scission resists for high-NA EUV lithography
Shirotori, Akihide; Hoshino, Manabu; Fujimura, Makoto; Yeh, Sin Fu; Suh, Hyo Seon; De Simone, Danilo; Vandenberghe, Geert; Sanuki, Hideaki (2023) -
EUV lithographic process enablement with novel litho track hardware
Santos, Andreia; Kosma, Vasiliki; Vandereyken, Jelle; Marhfour, H.; Tanaka, Y.; Harumoto, M.; Asai, M.; Stokes, H.; Suh, Hyo Seon; Foubert, Philippe; De Simone, Danilo (2021) -
Fabrication challenges in integrating self-assembled block copolymer process in semiconductor devices
Seema Saseendran, Sandeep; Paneri, Abhilash; Tobback, Bert; Kutrzeba Kotowska, Bogumila; Vecchio, Emma; Jamieson, Geraldine; Paraschiv, Vasile; Figeys, Bruno; Suh, Hyo Seon; Sabuncuoglu Tezcan, Deniz; Takahashi, Kohei; Fujikane, Masaki; Himeno, Atsushi; Nakamura, Kunihiko; Tambo, Naoki; Nakata, Yuki; Tanaka, Hiroyuki; Naito, Yasuyuki (2020) -
Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysis
Fallica, Roberto; Huang, Weizhong; Suh, Hyo Seon; De Simone, Danilo; Guerrero, Douglas J.; Kato, Kodai (2023) -
Grazing-incidence small angle x-ray scattering studies of nanoscale polymer gratings
Doxastakis, Manolis; Suh, Hyo Seon; Chen, Xuanxuan; Rincon Delgadillo, Paulina; Wan, Lingshu; Williamson, Lance; Jiang, Zhang; Strzalka, Joseph; Wang, Jin; Chen, Wei; Ferrier, Nicola; Ramirez-Hernandez, Abelardo; de Pablo, Juan; Gronheid, Roel; Nealey, Paul (2015) -
High volume manufacturing readiness of DSA process
Suh, Hyo Seon (2019) -
Impact of annealing temperature on DSA process: toward faster assembly kinetics
Suh, Hyo Seon; Nair, Vineet Vijayakrishnan; Rincon Delgadillo, Paulina; Doise, Jan; Lorusso, Gian; Nealey, Paul; Monreal, Victor; Baskaran, Durairaj; Cao, Yi; Padmanaban, Munirathna; Li, Jin; Kato, Takeshi; Sutani, Takumichi; Ishimoto, Toru; Ikota, Masami; Koshihara, Shunsuke (2018) -
Kinetics of defect annihilation in chemo-epitaxy directed self-assembly
Li, Jiajing; Rincon Delgadillo, Paulina; Suh, Hyo Seon; Mannaert, Geert; Nealey, Paul F. (2019) -
Material and process optimization for EUV pattern rectification by DSA
Verstraete, Lander; Suh, Hyo Seon; Van Bel, Julie; Bak, Byeong-U; Kim, Seong Eun; Vallat, Remi; Bezard, Philippe; Beggiato, Matteo; Beral, Christophe (2024) -
Outlier analysis for understanding process variations and probable defects
Gupta, Mihir; Rincon Delgadillo, Paulina; Suh, Hyo Seon; Halder, Sandip; Dusa, Mircea (2022) -
Roughness study on L/S patterning with chemo
Dudash, Viktor; Suh, Hyo Seon; Lorusso, Gian; Her, YoungJun; Li, Jin; Monreal, Victor; Baskaran, Durairaj; ALPERSON, BOAZ; SKJONNEMAND, KARL; Mack, Chris (2019) -
Roughness study on line and space patterning with chemo-epitaxy directed self-assembly
Suh, Hyo Seon; Dudash, Viktor; Lorusso, Gian; Her, YoungJun; Li, Jin; Monreal, Victor; Baskaran, Durairaj; ALPERSON, BOAZ; SKJONNEMAND, KARL; Mack, Chris (2020) -
Scaled-down deposited underlayers for EUV lithography
Gupta, Mihir; Afonso, Joao Antunes; Bezard, Philippe; Vallat, Remi; Fallica, Roberto; Suh, Hyo Seon; Halder, Sandip; De Simone, Danilo; Liu, Zecheng; Ran, Fanyong; Fukuda, Hideaki; Sun, Yiting; De Roest, David; Piumi, Daniele (2023) -
Scaling and readiness of underlayers for high-NA EUV lithography
Fallica, Roberto; De Simone, Danilo; Chen, Steven; Safdar, Muhammad; Suh, Hyo Seon (2022) -
Scaling and readiness of underlayers for high-numerical aperture extreme ultraviolet lithography
Fallica, Roberto; De Simone, Danilo; Chen, Steven; Safdar, Muhammad; Suh, Hyo Seon (2022) -
Shear-Rolling Process for Unidirectionally and Perpendicularly Oriented Sub-10-nm Block Copolymer Patterns on the 4 in Scale
Oh, Jinwoo; Shin, Minkyung; Kim, In Soo; Suh, Hyo Seon; Kim, YongJoo; Kim, Jai Kyeong; Bang, Joona; Yeom, Bongjun; Son, Jeong Gon (2021) -
Strategies for increasing the rate of defect annihilation in the directed self-assembly of high- $v block copolymers
Doise, Jan; Koh, Jai Hyun; Kim, Ji Yeon; Zhu, Qingjun; Kinoshita, Natsuko; Suh, Hyo Seon; Rincon Delgadillo, Paulina; Vandenberghe, Geert; Willson, C. Grant; Ellison, Christopher J. (2019)