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Material and process optimization for EUV pattern rectification by DSA
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Authors
Verstraete, Lander
;
Suh, Hyo Seon
;
Van Bel, Julie
;
Bak, Byeong-U
;
Kim, Seong Eun
;
Vallat, Remi
;
Bezard, Philippe
;
Beggiato, Matteo
;
Beral, Christophe
DOI
10.1117/12.3010817
EISBN
978-1-5106-7219-2
ISBN
978-1-5106-7218-5
ISSN
0277-786X
Conference
Conference on Novel Patterning Technologies
Journal
Proceedings of SPIE
Volume
12956
Title
Material and process optimization for EUV pattern rectification by DSA
Publication type
Proceedings paper
Embargo date
2024-04-09
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2
20.500.12860/43992.2
*
2024-08-27T09:15:09Z
validation by library/open access desk
1
20.500.12860/43992
2024-06-06T18:30:26Z
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