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Material and process optimization for EUV pattern rectification by DSA

dc.contributor.authorVerstraete, Lander
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorVan Bel, Julie
dc.contributor.authorBak, Byeong-U
dc.contributor.authorKim, Seong Eun
dc.contributor.authorVallat, Remi
dc.contributor.authorBezard, Philippe
dc.contributor.authorBeggiato, Matteo
dc.contributor.authorBeral, Christophe
dc.date.accessioned2024-08-27T09:25:36Z
dc.date.available2024-06-06T18:30:26Z
dc.date.available2024-08-27T09:25:36Z
dc.date.issued2024
dc.identifier.isbn978-1-5106-7218-5
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001222851800013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43992.2
dc.sourceWOS
dc.titleMaterial and process optimization for EUV pattern rectification by DSA
dc.typeProceedings paper
dc.contributor.imecauthorVerstraete, Lander
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorVan Bel, Julie
dc.contributor.imecauthorBak, Byeong-U
dc.contributor.imecauthorKim, Seong Eun
dc.contributor.imecauthorVallat, Remi
dc.contributor.imecauthorBezard, Philippe
dc.contributor.imecauthorBeggiato, Matteo
dc.contributor.imecauthorBeral, Christophe
dc.contributor.orcidimecVerstraete, Lander::0000-0002-3679-811X
dc.contributor.orcidimecSuh, Hyo Seon::0000-0003-4370-5062
dc.contributor.orcidimecVan Bel, Julie::0000-0002-4287-9725
dc.contributor.orcidimecVallat, Remi::0000-0003-0922-2446
dc.contributor.orcidimecBezard, Philippe::0000-0003-2499-0240
dc.contributor.orcidimecBeggiato, Matteo::0000-0003-0873-9021
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.date.embargo2024-04-09
dc.identifier.doi10.1117/12.3010817
dc.identifier.eisbn978-1-5106-7219-2
dc.source.numberofpages9
dc.source.peerreviewyes
dc.source.beginpageArt. 129560G
dc.source.conferenceConference on Novel Patterning Technologies
dc.source.conferencedateFEB 26-29, 2024
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.volume12956
imec.availabilityPublished - open access


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220.500.12860/43992.2*2024-08-27T09:15:09Zvalidation by library/open access desk
120.500.12860/439922024-06-06T18:30:26Z

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