dc.contributor.author | Verstraete, Lander | |
dc.contributor.author | Suh, Hyo Seon | |
dc.contributor.author | Van Bel, Julie | |
dc.contributor.author | Bak, Byeong-U | |
dc.contributor.author | Kim, Seong Eun | |
dc.contributor.author | Vallat, Remi | |
dc.contributor.author | Bezard, Philippe | |
dc.contributor.author | Beggiato, Matteo | |
dc.contributor.author | Beral, Christophe | |
dc.date.accessioned | 2024-08-27T09:25:36Z | |
dc.date.available | 2024-06-06T18:30:26Z | |
dc.date.available | 2024-08-27T09:25:36Z | |
dc.date.issued | 2024 | |
dc.identifier.isbn | 978-1-5106-7218-5 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:001222851800013 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43992.2 | |
dc.source | WOS | |
dc.title | Material and process optimization for EUV pattern rectification by DSA | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Verstraete, Lander | |
dc.contributor.imecauthor | Suh, Hyo Seon | |
dc.contributor.imecauthor | Van Bel, Julie | |
dc.contributor.imecauthor | Bak, Byeong-U | |
dc.contributor.imecauthor | Kim, Seong Eun | |
dc.contributor.imecauthor | Vallat, Remi | |
dc.contributor.imecauthor | Bezard, Philippe | |
dc.contributor.imecauthor | Beggiato, Matteo | |
dc.contributor.imecauthor | Beral, Christophe | |
dc.contributor.orcidimec | Verstraete, Lander::0000-0002-3679-811X | |
dc.contributor.orcidimec | Suh, Hyo Seon::0000-0003-4370-5062 | |
dc.contributor.orcidimec | Van Bel, Julie::0000-0002-4287-9725 | |
dc.contributor.orcidimec | Vallat, Remi::0000-0003-0922-2446 | |
dc.contributor.orcidimec | Bezard, Philippe::0000-0003-2499-0240 | |
dc.contributor.orcidimec | Beggiato, Matteo::0000-0003-0873-9021 | |
dc.contributor.orcidimec | Beral, Christophe::0000-0003-1356-9186 | |
dc.date.embargo | 2024-04-09 | |
dc.identifier.doi | 10.1117/12.3010817 | |
dc.identifier.eisbn | 978-1-5106-7219-2 | |
dc.source.numberofpages | 9 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 129560G | |
dc.source.conference | Conference on Novel Patterning Technologies | |
dc.source.conferencedate | FEB 26-29, 2024 | |
dc.source.conferencelocation | San Jose | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12956 | |
imec.availability | Published - open access | |