Browsing by author "Bezard, Philippe"
Now showing items 1-9 of 9
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Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-chi Block Copolymers
Pound-Lana, Gwenaelle; Bezard, Philippe; Petit-Etienne, Camille; Cavalaglio, Sebastien; Cunge, Gilles; Cabannes-Boue, Benjamin; Fleury, Guillaume; Chevalier, Xavier; Zelsmann, Marc (2021) -
High-Density Patterning of InGaZnO by CH4: a Comparative Study of RIE and Pulsed Plasma ALE
Kundu, Shreya; Decoster, Stefan; Bezard, Philippe; Nalin Mehta, Ankit; Dekkers, Harold; Lazzarino, Frederic (2022-07-19) -
Impact of vacuum ultraviolet photons on ultrathin polymethylmethacrylate during plasma etching
Arvind, Shikhar; Witting Larsen, Esben; Bezard, Philippe; Petersen, John; De Gendt, Stefan (2024) -
Material and process optimization for EUV pattern rectification by DSA
Verstraete, Lander; Suh, Hyo Seon; Van Bel, Julie; Bak, Byeong-U; Kim, Seong Eun; Vallat, Remi; Bezard, Philippe; Beggiato, Matteo; Beral, Christophe (2024) -
Multifunctional Top-Coats Strategy for DSA of High-chi Block Copolymers
Chevalier, Xavier; Correia, Cindy Gomes; Pound-Lana, Gwenaelle; Bezard, Philippe; Serege, Matthieu; Petit-Etienne, Camille; Gay, Guillaume; Cunge, Gilles; Cabannes-Boue, Benjamin; Nicolet, Celia; Navarro, Christophe; Cayrefource, Ian; Mueller, Marcus; Hadziioannou, Georges; Iliopoulos, Ilias; Fleury, Guillaume; Zelsmann, Marc (2021) -
Scaled-down deposited underlayers for EUV lithography
Gupta, Mihir; Afonso, Joao Antunes; Bezard, Philippe; Vallat, Remi; Fallica, Roberto; Suh, Hyo Seon; Halder, Sandip; De Simone, Danilo; Liu, Zecheng; Ran, Fanyong; Fukuda, Hideaki; Sun, Yiting; De Roest, David; Piumi, Daniele (2023) -
Top-coats for scalable Nano-manufacturing with High-chi Block Copolymers in Lithographic Applications
Chevalier, Xavier; Correia, Cindy Gomez; Pound-Lana, Gwenaelle; Bezard, Philippe; Serege, Matthieu; Petit-Etienne, Camille; Gay, Guillaume; Cunge, Gilles; Cabannes-Boue, Benjamin; Nicolet, Celia; Navarro, Christophe; Cayrefourcq, Ian; Mueller, Marcus; Hadziioannou, Georges; Iliopoulos, Ilias; Fleury, Guillaume; Zelsmann, Marc (2021) -
Towards high NA patterning readiness: Materials, processes and etch transfer for P24 Line Space
Santaclara, J. G.; Maslow, M. J.; Thiam, Arame; Franke, Joern-Holger; Schleicher, Filip; Blanc, Romuald; Bezard, Philippe; Moussa, Alain; Hendrickx, Eric; Wong, Patrick (2021) -
Where to apply sustainability optimizations in process flows?
Filippidou, Konstantina; Bezard, Philippe; Liu, I-Yun; Rolin, Cedric; Lazzarino, Frederic; Ragnarsson, Lars-Ake (2024)