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Top-coats for scalable Nano-manufacturing with High-chi Block Copolymers in Lithographic Applications
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Authors
Chevalier, Xavier
;
Correia, Cindy Gomez
;
Pound-Lana, Gwenaelle
;
Bezard, Philippe
;
Serege, Matthieu
;
Petit-Etienne, Camille
;
Gay, Guillaume
;
Cunge, Gilles
;
Cabannes-Boue, Benjamin
;
Nicolet, Celia
;
Navarro, Christophe
;
Cayrefourcq, Ian
;
Mueller, Marcus
;
Hadziioannou, Georges
;
Iliopoulos, Ilias
;
Fleury, Guillaume
;
Zelsmann, Marc
DOI
10.1117/12.2583717
EISBN
978-1-5106-4058-0
ISBN
978-1-5106-4057-3
ISSN
0277-786X
Conference
Conference on Advances in Patterning Materials and Processes XXXVIII Part of SPIE Advanced Lithography Conference
Journal
Proceedings of SPIE
Volume
11612
Title
Top-coats for scalable Nano-manufacturing with High-chi Block Copolymers in Lithographic Applications
Publication type
Proceedings paper
Embargo date
2021-12-31
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3
20.500.12860/41799.3
*
2023-08-08T08:48:40Z
validation by library/open access desk
1
20.500.12860/41799
2023-06-20T10:33:10Z
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