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Top-coats for scalable Nano-manufacturing with High-chi Block Copolymers in Lithographic Applications

dc.contributor.authorChevalier, Xavier
dc.contributor.authorCorreia, Cindy Gomez
dc.contributor.authorPound-Lana, Gwenaelle
dc.contributor.authorBezard, Philippe
dc.contributor.authorSerege, Matthieu
dc.contributor.authorPetit-Etienne, Camille
dc.contributor.authorGay, Guillaume
dc.contributor.authorCunge, Gilles
dc.contributor.authorCabannes-Boue, Benjamin
dc.contributor.authorNicolet, Celia
dc.contributor.authorNavarro, Christophe
dc.contributor.authorCayrefourcq, Ian
dc.contributor.authorMueller, Marcus
dc.contributor.authorHadziioannou, Georges
dc.contributor.authorIliopoulos, Ilias
dc.contributor.authorFleury, Guillaume
dc.contributor.authorZelsmann, Marc
dc.date.accessioned2023-08-08T08:53:52Z
dc.date.available2023-06-20T10:33:10Z
dc.date.available2023-08-08T08:53:52Z
dc.date.issued2021
dc.identifier.isbn978-1-5106-4057-3
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000844537900016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41799.3
dc.sourceWOS
dc.titleTop-coats for scalable Nano-manufacturing with High-chi Block Copolymers in Lithographic Applications
dc.typeProceedings paper
dc.contributor.imecauthorBezard, Philippe
dc.contributor.orcidextPetit-Etienne, Camille::0000-0003-4199-5529
dc.contributor.orcidextCayrefourcq, Ian::0000-0002-4040-6019
dc.date.embargo2021-12-31
dc.identifier.doi10.1117/12.2583717
dc.identifier.eisbn978-1-5106-4058-0
dc.source.numberofpages8
dc.source.peerreviewyes
dc.source.beginpage116120O
dc.source.conferenceConference on Advances in Patterning Materials and Processes XXXVIII Part of SPIE Advanced Lithography Conference
dc.source.conferencedateFEB 22-26, 2021
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.volume11612
imec.availabilityPublished - open access


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320.500.12860/41799.3*2023-08-08T08:48:40Zvalidation by library/open access desk
120.500.12860/417992023-06-20T10:33:10Z

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