Toggle navigation
My submissions
Login
Toggle navigation
View item
imec Publications Repository
imec Publications
Conference contributions
View item
imec Publications Repository
imec Publications
Conference contributions
View item
JavaScript is disabled for your browser. Some features of this site may not work without it.
Scaled-down deposited underlayers for EUV lithography
Metadata
Show full item record
Authors
Gupta, Mihir
;
Afonso, Joao Antunes
;
Bezard, Philippe
;
Vallat, Remi
;
Fallica, Roberto
;
Suh, Hyo Seon
;
Halder, Sandip
;
De Simone, Danilo
;
Liu, Zecheng
;
Ran, Fanyong
;
Fukuda, Hideaki
;
Sun, Yiting
;
De Roest, David
;
Piumi, Daniele
DOI
10.1117/12.2660376
EISBN
978-1-5106-6104-2
ISBN
978-1-5106-6103-5
ISSN
0277-786X
Conference
Conference on Advances in Patterning Materials and Processes XL
Journal
Proceedings of SPIE
Volume
12498
Title
Scaled-down deposited underlayers for EUV lithography
Publication type
Proceedings paper
Collections
Conference contributions
Version history
Version
Item
Date
Summary
2
20.500.12860/42223.2
*
2024-03-07T15:10:11Z
validation by library/open access desk
1
20.500.12860/42223
2023-07-28T17:39:36Z
*Selected version
Search imec Publications Repository
This collection
Browse
All of imec Publications Repository
Collections
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
This collection
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
My account
login