dc.contributor.author | Gupta, Mihir | |
dc.contributor.author | Afonso, Joao Antunes | |
dc.contributor.author | Bezard, Philippe | |
dc.contributor.author | Vallat, Remi | |
dc.contributor.author | Fallica, Roberto | |
dc.contributor.author | Suh, Hyo Seon | |
dc.contributor.author | Halder, Sandip | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Liu, Zecheng | |
dc.contributor.author | Ran, Fanyong | |
dc.contributor.author | Fukuda, Hideaki | |
dc.contributor.author | Sun, Yiting | |
dc.contributor.author | De Roest, David | |
dc.contributor.author | Piumi, Daniele | |
dc.date.accessioned | 2024-03-07T15:13:32Z | |
dc.date.available | 2023-07-28T17:39:36Z | |
dc.date.available | 2024-03-07T15:13:32Z | |
dc.date.issued | 2023 | |
dc.identifier.isbn | 978-1-5106-6103-5 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:001022961000015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/42223.2 | |
dc.source | WOS | |
dc.title | Scaled-down deposited underlayers for EUV lithography | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Gupta, Mihir | |
dc.contributor.imecauthor | Bezard, Philippe | |
dc.contributor.imecauthor | Vallat, Remi | |
dc.contributor.imecauthor | Fallica, Roberto | |
dc.contributor.imecauthor | Suh, Hyo Seon | |
dc.contributor.imecauthor | Halder, Sandip | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.orcidimec | Gupta, Mihir::0000-0003-0286-7997 | |
dc.contributor.orcidimec | Fallica, Roberto::0000-0003-4523-9624 | |
dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | Bezard, Philippe::0000-0003-2499-0240 | |
dc.contributor.orcidimec | Vallat, Remi::0000-0003-0922-2446 | |
dc.contributor.orcidimec | Suh, Hyo Seon::0000-0003-4370-5062 | |
dc.identifier.doi | 10.1117/12.2660376 | |
dc.identifier.eisbn | 978-1-5106-6104-2 | |
dc.source.numberofpages | 6 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 124980R | |
dc.source.conference | Conference on Advances in Patterning Materials and Processes XL | |
dc.source.conferencedate | FEB 27-MAR 01, 2023 | |
dc.source.conferencelocation | San Jose | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12498 | |
imec.availability | Published - imec | |