Authors
Santaclara, J. G.;
Maslow, M. J.;
Thiam, Arame;
Franke, Joern-Holger;
Schleicher, Filip;
Blanc, Romuald;
Bezard, Philippe;
Moussa, Alain;
Hendrickx, Eric;
Wong, Patrick
EISBN
978-1-5106-4553-0
ISBN
978-1-5106-4552-3
ISSN
0277-786X
Conference
International Conference on Extreme Ultraviolet Lithography
Journal
Proceedings of SPIE
Volume
11854
Title
Towards high NA patterning readiness: Materials, processes and etch transfer for P24 Line Space
Publication type
Proceedings paper