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Towards high NA patterning readiness: Materials, processes and etch transfer for P24 Line Space

dc.contributor.authorSantaclara, J. G.
dc.contributor.authorMaslow, M. J.
dc.contributor.authorThiam, Arame
dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorSchleicher, Filip
dc.contributor.authorBlanc, Romuald
dc.contributor.authorBezard, Philippe
dc.contributor.authorMoussa, Alain
dc.contributor.authorHendrickx, Eric
dc.contributor.authorWong, Patrick
dc.date.accessioned2022-06-02T13:26:08Z
dc.date.available2022-05-22T02:19:05Z
dc.date.available2022-06-02T13:26:08Z
dc.date.issued2021
dc.identifier.isbn978-1-5106-4552-3
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000792657300005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39868.2
dc.sourceWOS
dc.titleTowards high NA patterning readiness: Materials, processes and etch transfer for P24 Line Space
dc.typeProceedings paper
dc.contributor.imecauthorThiam, Arame
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorSchleicher, Filip
dc.contributor.imecauthorBlanc, Romuald
dc.contributor.imecauthorBezard, Philippe
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorWong, Patrick
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecSchleicher, Filip::0000-0003-3630-7285
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.identifier.doi10.1117/12.2601839
dc.identifier.eisbn978-1-5106-4553-0
dc.source.numberofpages14
dc.source.peerreviewyes
dc.source.beginpage118540A
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 27-OCT 01, 2021
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.volume11854
imec.availabilityPublished - imec


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220.500.12860/39868.2*2022-06-02T13:21:21Zvalidation by library/open access desk
120.500.12860/398682022-05-22T02:19:05Z

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