Browsing by author "Hendrickx, Eric"
Now showing items 1-20 of 173
-
22nm node imaging and beyond: a comparison of EUV and ArFi double patterning
van Setten, Eelco; Mouraille, O.; Wittebrood, F.; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
22nm node imaging and beyond: When will EUV take over?
van Setten, Eelco; Mouraille, Orion; Wittebrood, Friso; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
32nm node technology development using interference immersion lithography
Sewell, H.; McCafferty, D.; Markoya, L.; Hendrickx, Eric; Hermans, Jan; Ronse, Kurt (2005) -
3D Mask modeling for EUV lithography
Mailfert, Julien; Zuniga, Christian; Philipsen, Vicky; Adam, Konstantinos; Lam, Michael; Word, James; Hendrickx, Eric; Vandenberghe, Geert; Smith, Bruce (2012) -
60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography
Bekaert, Joost; Hendrickx, Eric; Vandenberghe, Geert (2008) -
A 0.314mm2 6T-SRAM cell built with tall triple-gate devices for 45nm node applications using 0.75NA 193nm lithography
Nackaerts, Axel; Ercken, Monique; Demuynck, Steven; Lauwers, Anne; Baerts, Christina; Bender, Hugo; Boullart, Werner; Collaert, Nadine; Degroote, Bart; Delvaux, Christie; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandervorst, Wilfried; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Jurczak, Gosia; Biesemans, Serge (2004-12) -
A method of image-based aberration metrology for EUVL tools
Levinson, Zac; Raghunathan, Sudhar; Verduijn, Erik; Wood, Obert; Mangat, Pawitter; Goldberg, Kenneth; Benk, Markus; Wojdyla, Antoine; Philipsen, Vicky; Hendrickx, Eric; Smith, Bruce (2015) -
Accurate EUV lithography simulation enabled by calibrated physical resist models
Klostermann, U.K.; Mulders, T.; Schmoeller, T.; Demmerle, W.; Lorusso, Gian; Hendrickx, Eric (2010-09) -
Accurate mapping of dose variations on EUV scanners using dose-to-clear exposures and optical ellipsometry
Nair, Vineet Vijayakrishnan; Van Look, Lieve; Aubert, Remko; Hendrickx, Eric (2020) -
Accurate models for EUV Lithography
Hendrickx, Eric; Lorusso, Gian; Van Setten, Eelco; Hansen, Steve; Jiang, Jiong; Liu, Wei; Chen, Luogi (2009) -
Accurate models for EUV lithography
Hendrickx, Eric; Lorusso, Gian; Jiang, Jiong; Chen, Luoqi; Lui, Wei; Van Setten, Eelca; Hansen, Steve (2009) -
Accurate models for EUV simulation and their use for design correction
Lorusso, Gian; Hermans, Jan; Baudemprez, Bart; Hendrickx, Eric; Klostermann, Ulrich K.; Jang, Stephen; Zavyalova, Lena; Sorensen, Jacob; Gao, Weimin; Lucas, Kevin (2009) -
Actinic characterization and modeling of the EUV mask stack
Philipsen, Vicky; Hendrickx, Eric; Jonckheere, Rik; Davydova, Natalia; Fliervoet, Timon; Neumann, Jens Timo (2013) -
Additional evidence of EUV blank defects first seen by wafer printing
Jonckheere, Rik; Van Den Heuvel, Dieter; Hendrickx, Eric; Ronse, Kurt; Bret, Tristan; Hofmann, Thorsten; Magana, John; Aharonson, Israel; Meshulach, Doron (2011) -
AIMS TM 45 inspection of CH treated with inverse lithography
Hendrickx, Eric; Birkner, Robert; Kempsell, Monica; Tritchkov, Alexander; Richter, Rigo; Vandenberghe, Geert; Scheruebl, Thomas (2008) -
AIMS-45 image validation of contact hole patterns after inverse lithography at NA 1.35
Hendrickx, Eric; Birkner, R.; Kempsell, Monica; Tritchkov, A.; Vandenberghe, Geert; Scheruebl, T. (2008) -
Alternative EUV mask technology for mask 3D effect compensation
Van Look, Lieve; Philipsen, Vicky; Hendrickx, Eric; Vandenberghe, Geert; Knops, Roel; Davydova, Natalia; Wittebrood, Friso; De Kruif, Robert; Van Oosten, Anton; Fliervoet, Timon; Van Schoot, Jan; Neumann, Jens Timo (2014) -
Alternative EUV mask technology to compensate for mask 3D effects
Van Look, Lieve; Philipsen, Vicky; Hendrickx, Eric; Vandenberghe, Geert; Davydova, Natalia; Wittebrood, Friso; De Kruif, Robert; Van Oosten, Anton; Miyazaki, Junji; Fliervoet, Timon; Van Schoot, Jan; Neumann, Jens Timo (2015) -
Application of pixel-based mask optimization technique for high-transmission attenuated PSM
Sakajiri, Kyohei; Tritchkov, Alexander; Granik, Yuri; Hendrickx, Eric; Vandenberghe, Geert; Kempsell, Monica; Fenger, Germain; Boehm, Klaus; Scheruebl, Thomas (2009) -
ArF immersion lithography for low k1 lines and contacts
Vandenberghe, Geert; Hendrickx, Eric; Wiaux, Vincent (2004-08)