Browsing by author "Hendrickx, Eric"
Now showing items 21-40 of 173
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ASML NXE:3100 pre-production EUV scanner performance at imec
Hendrickx, Eric (2012) -
Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
Luong, Vu; Philipsen, Vicky; Opsomer, Karl; Rip, Jens; Hendrickx, Eric; Heyns, Marc; Detavernier, Christophe; Laubis, Christian; Scholze, Frank (2019) -
Assist features: placement, impact and relevance
Mochi, Iacopo; Philipsen, Vicky; Gallagher, Emily; Hendrickx, Eric; Lyakhova, Kateryna; Wittebrood, Friso; Schiffelers, Guido; Fliervoet, Timon; Wang, Shibing; Hsu, Stephen; Plachecki, Vince; Baron, Stan; Laenens, Bart (2016) -
Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?
Erdmann, Andreas; Evanschitzky, Peter; Mesilhy, Hazem; Philipsen, Vicky; Hendrickx, Eric; Bauer, Markus (2018) -
Attenuated PSM for EUV: Can they mitigate 3D mask effects?
Erdmann, Andreas; Evanschitzky, Peter; Mesilhy, Hazem; Philipsen, Vicky; Hendrickx, Eric; Bauer, Markus (2018) -
BARC process optimatization for hyper NA tools and influence of polarization on CD swing and standing waves
Op de Beeck, Maaike; Hermans, Jan; Foubert, Philippe; Wiaux, Vincent; Hendrickx, Eric (2005) -
Calibration and verification of a stochastic model for EUV resist
Gao, Weimin; Philippou, Alexander; Klostermann, Ulrich; Siebert, Joachim; Philipsen, Vicky; Hendrickx, Eric; Vandeweyer, Tom; Jonckheere, Rik (2012) -
Calibration of physical resist models for simulation of extreme ultraviolet lithography
Klostermann, Ulrich K.; Muelders, Thomas; Schmoeller, Thomas; Lorusso, Gian; Hendrickx, Eric (2011) -
Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures
Bekaert, Joost; Gallagher, Emily; Jonckheere, Rik; Van Look, Lieve; Aubert, Remko; Klein, Alexander; Yegen, Gokay; Broman, Par; Nair, Vineet Vijayakrishnan; Timmermans, Marina; Pollentier, Ivan; Hendrickx, Eric (2021-05-27) -
Characterization and mitigation of 3D mask effects
Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Philipsen, Vicky; Luong, Vu; Hendrickx, Eric (2017) -
Characterization and mitigation of 3D mask effects in EUV lithography
Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Luong, Vu; Philipsen, Vicky; Hendrickx, Eric (2016) -
Characterization of EUV resists for defectivity at 32nm
Montal, Ofir; Dolev, Ido; Rosenzweig, Moshe; Dotan, Kfir; Meshulach, Doron; Adan, Ofer; Levi, Shimon; Cai, Man-Ping; Bencher, Chris; Ngai, Christopher S.; Jehoul, Christiane; Van Den Heuvel, Dieter; Hendrickx, Eric (2011) -
Characterization of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images
Raghunathan, Sudhar; Wood, Obert; Mangat, Pawitter; Verduijn, Erik; Philipsen, Vicky; Hendrickx, Eric; Jonckheere, Rik; Goldberg, Ken; Benk, Marcus; Kearney, Pat; Levinson, Zachary; Smith, Bruce (2014) -
Chromeless phase lithography for contact hole imaging
Vandenberghe, Geert; Hendrickx, Eric; Wiaux, Vincent (2004) -
CNT pellicles: Imaging results of the first full-field EUV exposures
Bekaert, Joost; Gallagher, Emily; Jonckheere, Rik; Van Look, Lieve; Aubert, Remko; Klein, Alexander; Yegen, Gokay; Broman, Par; Felix, Nelson M.; Lio, Anna; Nair, Vineet Vijayakrishnan; Timmermans, Marina; Pollentier, Ivan; Hendrickx, Eric (2021) -
Combined illumination sources for hyper-NA contact hole printing
Bekaert, Joost; Truffert, Vincent; Willems, Patrick; Van Look, Lieve; Op de Beeck, Maaike; Hendrickx, Eric; Vandenberghe, Geert (2007) -
Comparison between existing inspection techniques for EUV mask defects
Van Den Heuvel, Dieter; Jonckheere, Rik; Hendrickx, Eric; Cheng, Shaunee; Ronse, Kurt; Abe, Tsukasa; Magana, John; Bret, Tristan (2010) -
Compensation of overlay errors due to mask bending and non-flatness for EUV masks
Chandhok, Manish; Goyal, Sanjay; Carson, Steve; Park, Seh-Jin; Zhang, Guojing; Myers, Alan; Leeson, Michael; Kamna, Marilyn; Martinez, Fabian; Stivers, Alan; Lorusso, Gian; Hermans, Jan; Hendrickx, Eric; Govindjee, Sanjay; Brandstetter, Gerd; Laursen, Tod (2009) -
Complementary dipole exposure solutions at 0.29k1
Hendrickx, Eric; Torres, Andres; Lafferty, Neal; Le Cam, Laurent; Johnson, Stephen; Reita, Carlo; Vandenberghe, Geert; Maurer, Wilhelm (2005) -
Creative metrology development for EUVL: Flare and out-of-band qualification
Lorusso, Gian; Hendrickx, Eric; Davydova, N.; Peng, Y.; Eurlings, M.; Feenstra, K.; Jiang, J. (2011)