Characterization of EUV resists for defectivity at 32nm

Thumbnail
View/open
Metadata
Show full item record
Authors
Montal, Ofir; Dolev, Ido; Rosenzweig, Moshe; Dotan, Kfir; Meshulach, Doron; Adan, Ofer; Levi, Shimon; Cai, Man-Ping; Bencher, Chris; Ngai, Christopher S.; Jehoul, Christiane; Van Den Heuvel, Dieter; Hendrickx, Eric
Conference
Metrology, Inspection, and Process Control XXV
Title
Characterization of EUV resists for defectivity at 32nm
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections