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Characterization of EUV resists for defectivity at 32nm
Publication:
Characterization of EUV resists for defectivity at 32nm
Date
2011
Proceedings Paper
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22428.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Montal, Ofir
;
Dolev, Ido
;
Rosenzweig, Moshe
;
Dotan, Kfir
;
Meshulach, Doron
;
Adan, Ofer
;
Levi, Shimon
;
Cai, Man-Ping
;
Bencher, Chris
;
Ngai, Christopher S.
;
Jehoul, Christiane
;
Van Den Heuvel, Dieter
;
Hendrickx, Eric
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Views
1923
since deposited on 2021-10-19
414
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations