Publication:

Characterization of EUV resists for defectivity at 32nm

Date

2011
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorMontal, Ofir
dc.contributor.authorDolev, Ido
dc.contributor.authorRosenzweig, Moshe
dc.contributor.authorDotan, Kfir
dc.contributor.authorMeshulach, Doron
dc.contributor.authorAdan, Ofer
dc.contributor.authorLevi, Shimon
dc.contributor.authorCai, Man-Ping
dc.contributor.authorBencher, Chris
dc.contributor.authorNgai, Christopher S.
dc.contributor.authorJehoul, Christiane
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorHendrickx, Eric
dc.contributor.imecauthorJehoul, Christiane
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.date.accessioned2021-10-19T16:30:02Z
dc.date.available2021-10-19T16:30:02Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19451
dc.source.beginpage79710G
dc.source.conferenceMetrology, Inspection, and Process Control XXV
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan José (CA) USA
dc.title

Characterization of EUV resists for defectivity at 32nm

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
22428.pdf
Size:
730.53 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions