Characterization and mitigation of 3D mask effects in EUV lithography

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Authors
Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Luong, Vu; Philipsen, Vicky; Hendrickx, Eric
Conference
International Symposium on Extreme Ultraviolet Lithography - EUVL
Title
Characterization and mitigation of 3D mask effects in EUV lithography
Publication type
Oral presentation
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