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Characterization and mitigation of 3D mask effects in EUV lithography
Publication:
Characterization and mitigation of 3D mask effects in EUV lithography
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Date
2016
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Erdmann, Andreas
;
Xu, Dongbo
;
Evanschitzky, Peter
;
Luong, Vu
;
Philipsen, Vicky
;
Hendrickx, Eric
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1996
since deposited on 2021-10-23
1
last month
Acq. date: 2025-12-11
Citations
Metrics
Views
1996
since deposited on 2021-10-23
1
last month
Acq. date: 2025-12-11
Citations