Browsing by author "Blanc, Romuald"
Now showing items 1-5 of 5
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28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography
Kim, Il Hwan; Kim, Insung; Park, Changmin; Lee, Jsiun; Ryu, Koungmin; De Schepper, P.; Doise, J.; Kocsis, M.; De Simone, Danilo; Kljucar, Luka; Das, Poulomi; Blanc, Romuald; Beral, Christophe; Severi, Joren; Vandenbroeck, Nadia; Foubert, Philippe; Charley, Anne-Laure; Oak, Apoorva; Xu, Dongbo; Gillijns, Werner; Mitard, Jerome; Tokei, Zsolt; van der Veen, Marleen; Heylen, Nancy; Teugels, Lieve; Le, Quoc Toan; Schleicher, Filip; Leray, Philippe; Ronse, Kurt (2021) -
Orthogonal Array Pillar Process Development for High Density 4F2 Memory Cells at 40nm Pitch and Beyond
Pak, Murat; Zanders, Wesley; Wong, Patrick; Halder, Sandip; Blanc, Romuald; Souriau, Laurent; Lee, Jeonghoon; Kar, Gouri Sankar (2022) -
Staggered pillar patterning using 0.33NA EUV lithography
De Simone, Danilo; Blanc, Romuald; Van de Kerkhove, Jeroen; Tamaddon, Amir-Hossein; Fallica, Roberto; Van Look, Lieve; Rassoul, Nouredine; Lazzarino, Frederic; Vandenbroeck, Nadia; Vanelderen, Pieter; Lorusso, Gian; Van Roey, Frieda; Charley, Anne-Laure; Vandenberghe, Geert; Ronse, Kurt; Lee, Kilyoung; Lee, Junghyung; Park, Sarohan; Lim, Chang-Moon; Park, Chan-Ha (2019) -
Tone reversal patterning for advanced technology nodes
Schleicher, Filip; Bekaert, Joost; Thiam, Arame; Decoster, Stefan; Blanc, Romuald; Lazzarino, Frederic; Santaclara, J. Garcia; Rispens, G.; Maslow, M. (2022) -
Towards high NA patterning readiness: Materials, processes and etch transfer for P24 Line Space
Santaclara, J. G.; Maslow, M. J.; Thiam, Arame; Franke, Joern-Holger; Schleicher, Filip; Blanc, Romuald; Bezard, Philippe; Moussa, Alain; Hendrickx, Eric; Wong, Patrick (2021)