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Development on main chain scission resists for high-NA EUV lithography

dc.contributor.authorShirotori, Akihide
dc.contributor.authorHoshino, Manabu
dc.contributor.authorFujimura, Makoto
dc.contributor.authorYeh, Sin Fu
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorSanuki, Hideaki
dc.date.accessioned2024-04-08T11:56:28Z
dc.date.available2023-07-28T17:39:56Z
dc.date.available2024-04-08T11:56:28Z
dc.date.issued2023
dc.identifier.isbn978-1-5106-6103-5
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001022961000002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42236.2
dc.sourceWOS
dc.titleDevelopment on main chain scission resists for high-NA EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecSuh, Hyo Seon::0000-0003-4370-5062
dc.contributor.orcidimecVandenberghe, Geert::0009-0001-2424-1322
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.identifier.doi10.1117/12.2657506
dc.identifier.eisbn978-1-5106-6104-2
dc.source.numberofpages12
dc.source.peerreviewyes
dc.source.beginpageArt. 1249807
dc.source.conferenceConference on Advances in Patterning Materials and Processes XL
dc.source.conferencedateFEB 27-MAR 01, 2023
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.volume12498
imec.availabilityPublished - imec


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220.500.12860/42236.2*2024-04-08T11:53:50Zvalidation by library/open access desk
120.500.12860/422362023-07-28T17:39:56Z

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