Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer

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Authors
De Simone, Danilo; Lyons, Adam; Rio, David; Lee, Sook; Delorme, Maxence; Fumar-Pici, Anita; Kocsis, Michael; De Schepper, Peter; Greer, Michael; Wallow, THomas; Stowers, Jason K; Gillijns, Werner; Bekaert, Joost
DOI
10.1117/12.2260441
Conference
Extreme Ultraviolet (EUV) Lithography VIII
Title
Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer
Publication type
Proceedings paper
Embargo date
9999-12-31
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