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Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer
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Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer
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Date
2017
Proceedings Paper
https://doi.org/10.1117/12.2260441
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Simone, Danilo
;
Lyons, Adam
;
Rio, David
;
Lee, Sook
;
Delorme, Maxence
;
Fumar-Pici, Anita
;
Kocsis, Michael
;
De Schepper, Peter
;
Greer, Michael
;
Wallow, THomas
;
Stowers, Jason K
;
Gillijns, Werner
;
Bekaert, Joost
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1999
since deposited on 2021-10-24
Acq. date: 2025-12-11
Citations
Metrics
Views
1999
since deposited on 2021-10-24
Acq. date: 2025-12-11
Citations