Publication:

Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer

Date

2017
Proceedings Paper
https://doi.org/10.1117/12.2260441
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dc.contributor.authorDe Simone, Danilo
dc.contributor.authorLyons, Adam
dc.contributor.authorRio, David
dc.contributor.authorLee, Sook
dc.contributor.authorDelorme, Maxence
dc.contributor.authorFumar-Pici, Anita
dc.contributor.authorKocsis, Michael
dc.contributor.authorDe Schepper, Peter
dc.contributor.authorGreer, Michael
dc.contributor.authorWallow, THomas
dc.contributor.authorStowers, Jason K
dc.contributor.authorGillijns, Werner
dc.contributor.authorBekaert, Joost
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorRio, David
dc.contributor.imecauthorKocsis, Michael
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorGreer, Michael
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.accessioned2021-10-24T03:55:56Z
dc.date.available2021-10-24T03:55:56Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.doi10.1117/12.2260441
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28157
dc.source.beginpage101431E
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.title

Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer

dc.typeProceedings paper
dspace.entity.typePublication
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