Browsing by author "Kuwahara, Yuhei"
Now showing items 1-12 of 12
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Advances and challenges in dual-tone development process optimization
Fonseca, Carlos; Somervell, Mark; Scheer, Steven; Printz, Wallace; Nafus, Kathleen; Hatakeyama, Shinichi; Kuwahara, Yuhei; Niwa, Takafumi; Bernard, Sophie; Gronheid, Roel (2009) -
Advances in dual-tone development for pitch frequency doubling
Fonseca, Carlos; Somervell, Mark; Scheer, Steven; Kuwahara, Yuhei; Nafus, Kathleen; Gronheid, Roel; Tarutani, Shinji; Enomoto, Yuuchiro (2010) -
Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Tadatomo, Hiroki; Dauendorffer, Arnaud; Onitsuka, Tomoya; Genjima, Hisashi; Ido, Yasuyuki; Okada, Soichiro; Kuwahara, Yuhei; Hara, Arisa; Dinh, Congque; Fujimoto, Seiji; Kawakami, Shinichiro; Muramatsu, Makoto; Shimura, Satoru; Nafus, Kathleen; Oikawa, Noriaki; Ono, Kenta; Feurprier, Yannick; Demand, Marc; Negreira, Ainhoa Romo; Nagahara, Seiji; Blanco, Victor; Foubert, Philippe; De Simone, Danilo (2022) -
Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation
Sayan, Safak; Tao, Zheng; Chan, BT; De Simone, Danilo; Kuwahara, Yuhei; Nafus, Kathleen; Leeson, Michael J.; Gstrein, Florian; Singh, Arjun; Vandenberghe, Geert (2015) -
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Dinh, Cong Que; Nagahara, Seiji; Kuwahara, Yuhei; Dauendorffer, Arnaud; Yoshida, Keisuke; Okada, Soichiro; Onitsuka, Tomoya; Kawakami, Shinichiro; Shimura, Satoru; Muramatsu, Makoto; Yoshihara, Kosuke; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Huli, Lior; Grzeskowiak, Steven; Krawicz, Alexandra; Bae, Nayoung; Kato, Kanzo; Nafus, Kathleen; Raley, Angelique (2022) -
EUV patterning improvement toward high-volume manufacturing
Kuwahara, Yuhei; Matsunaga, Koichi; Kawakami, Shinichiro; Nafus, Kathleen; Foubert, Philippe; Goethals, Mieke (2015) -
EUV process establishment through litho and etch for N7 node
Kuwahara, Yuhei; Kawakami, Shinichiro; Kubota, Minoru; Matsunaga, Koichi; Nafus, Kathleen; Foubert, Philippe; Mao, Ming (2016) -
Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials
Rathsack, Ben; Scheer, Steven; Kuwahara, Yuhei; Kitano, Junichi; Gronheid, Roel; Baerts, Christina (2008) -
Manufacturability improvements in EUV resist processing towards NXE:3300 processing
Kuwahara, Yuhei; Matsunaga, Koichi; Shimoaoki, Takeshi; Kawakami, Shinichiro; Nafus, Kathleen; Foubert, Philippe; Goethals, Mieke; Shimura, Satoru (2014) -
Novel metal containing resists for EUV lithography extendibility
De Simone, Danilo; Sayan, Safak; Dei, Satoshi; Pollentier, Ivan; Kuwahara, Yuhei; Vandenberghe, Geert; Nafus, Kathleen; Shiratani, Motohiro; Nakagawa, Hisashi; Naruoka, Takehiko (2016) -
Recent advances in EUV patterning in preparation towards high-NA EUV
Nagahara, Seiji; Dauendorffer, Arnaud; Thiam, Arame; Liu, Xiang; Kuwahara, Yuhei; Dinh, Cong Que; Okada, Soichiro; Kawakami, Shinichiro; Genjima, Hisashi; Nagamine, Noriaki; Muramatsu, Makoto; Shimura, Satoru; Tsuboi, Atsushi; Nafus, Kathleen; Feurprier, Yannick; Demand, Marc; Ramaneti, Rajesh; Foubert, Philippe; De Simone, Danilo; Vandenberghe, Geert (2023) -
Resist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects
Rathsack, Benjamin; Nafus, Kathleen; Hatakeyama, Shinichi; Kuwahara, Yuhei; Kitano, Junichi; Gronheid, Roel; Vaglio Pret, Alessandro (2009)