Browsing by author "Okada, Soichiro"
Now showing items 1-3 of 3
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Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Tadatomo, Hiroki; Dauendorffer, Arnaud; Onitsuka, Tomoya; Genjima, Hisashi; Ido, Yasuyuki; Okada, Soichiro; Kuwahara, Yuhei; Hara, Arisa; Dinh, Congque; Fujimoto, Seiji; Kawakami, Shinichiro; Muramatsu, Makoto; Shimura, Satoru; Nafus, Kathleen; Oikawa, Noriaki; Ono, Kenta; Feurprier, Yannick; Demand, Marc; Negreira, Ainhoa Romo; Nagahara, Seiji; Blanco, Victor; Foubert, Philippe; De Simone, Danilo (2022) -
Co-optimization of lithographic and patterning processes for improved EPE performance
Maslow, Mark; Timoshkov, Vadim; Kiers, Ton; Jee, Tae Kwon; de Loijer, Peter; Morikita, Shinya; Demand, Mark; Metz, Andrew W; Okada, Soichiro; Kumar, Kaushik A.; Biesemans, Serge; Yaegashi, Hidetami; Di Lorenzo, Paolo; Bekaert, Joost; Mao, Ming; Beral, Christophe; Lariviere, Stephane (2017) -
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Dinh, Cong Que; Nagahara, Seiji; Kuwahara, Yuhei; Dauendorffer, Arnaud; Yoshida, Keisuke; Okada, Soichiro; Onitsuka, Tomoya; Kawakami, Shinichiro; Shimura, Satoru; Muramatsu, Makoto; Yoshihara, Kosuke; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Huli, Lior; Grzeskowiak, Steven; Krawicz, Alexandra; Bae, Nayoung; Kato, Kanzo; Nafus, Kathleen; Raley, Angelique (2022)