dc.contributor.author | Fallica, Roberto | |
dc.contributor.author | Chen, Steven | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Suh, Hyo Seon | |
dc.date.accessioned | 2022-12-21T11:12:27Z | |
dc.date.available | 2022-10-29T02:58:13Z | |
dc.date.available | 2022-11-03T09:46:47Z | |
dc.date.available | 2022-12-21T11:12:27Z | |
dc.date.issued | 2022 | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:000867486800008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40630.3 | |
dc.source | WOS | |
dc.title | Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers | |
dc.type | Journal article | |
dc.contributor.imecauthor | Fallica, Roberto | |
dc.contributor.imecauthor | Chen, Steven | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Suh, Hyo Seon | |
dc.contributor.orcidimec | Fallica, Roberto::0000-0003-4523-9624 | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.identifier.doi | 10.1117/1.JMM.21.3.034601 | |
dc.source.numberofpages | 9 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 034601 | |
dc.source.endpage | na | |
dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
dc.source.issue | 3 | |
dc.source.volume | 21 | |
imec.availability | Published - open access | |