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Dual monopole exposure strategy to improve extreme ultraviolet imaging

dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorBrunner, Timothy A.
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2023-03-30T10:53:39Z
dc.date.available2022-10-29T02:58:13Z
dc.date.available2023-03-30T10:53:39Z
dc.date.issued2022
dc.identifier.issn1932-5150
dc.identifier.otherWOS:000867486800002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40631.2
dc.sourceWOS
dc.titleDual monopole exposure strategy to improve extreme ultraviolet imaging
dc.typeJournal article
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.date.embargo2023-07-20
dc.identifier.doi10.1117/1.JMM.21.3.030501
dc.source.numberofpages7
dc.source.peerreviewyes
dc.source.beginpage030501
dc.source.endpagena
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.issue3
dc.source.volume21
imec.availabilityPublished - imec


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220.500.12860/40631.2*2023-03-30T10:52:16Zvalidation by library/open access desk
120.500.12860/406312022-10-29T02:58:13Z

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