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Capturing the Effects of Spatial Process Variations in Silicon Photonic Circuits
dc.contributor.author | Xing, Yufei | |
dc.contributor.author | Dong, Jiaxing | |
dc.contributor.author | Khan, Umar | |
dc.contributor.author | Bogaert, Wim | |
dc.date.accessioned | 2022-12-10T03:09:31Z | |
dc.date.available | 2022-12-10T03:09:31Z | |
dc.date.issued | 2022-NOV 22 | |
dc.identifier.issn | 2330-4022 | |
dc.identifier.other | WOS:000889730400001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40855 | |
dc.source | WOS | |
dc.title | Capturing the Effects of Spatial Process Variations in Silicon Photonic Circuits | |
dc.type | Journal article | |
dc.type | Journal article (pre-print) | |
dc.contributor.imecauthor | Xing, Yufei | |
dc.contributor.imecauthor | Dong, Jiaxing | |
dc.contributor.imecauthor | Bogaert, Wim | |
dc.identifier.doi | 10.1021/acsphotonics.2c01194 | |
dc.source.numberofpages | 17 | |
dc.source.peerreview | yes | |
dc.source.journal | ACS PHOTONICS | |
imec.availability | Under review |