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Scaling and readiness of underlayers for high-numerical aperture extreme ultraviolet lithography
dc.contributor.author | Fallica, Roberto | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Chen, Steven | |
dc.contributor.author | Safdar, Muhammad | |
dc.contributor.author | Suh, Hyo Seon | |
dc.date.accessioned | 2023-03-05T10:01:08Z | |
dc.date.available | 2023-03-01T03:27:52Z | |
dc.date.available | 2023-03-05T10:01:08Z | |
dc.date.issued | 2022 | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:000924949300027 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41206.2 | |
dc.source | WOS | |
dc.title | Scaling and readiness of underlayers for high-numerical aperture extreme ultraviolet lithography | |
dc.type | Journal article | |
dc.contributor.imecauthor | Fallica, Roberto | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Chen, Steven | |
dc.contributor.imecauthor | Safdar, Muhammad | |
dc.contributor.imecauthor | Suh, Hyo Seon | |
dc.contributor.orcidimec | Fallica, Roberto::0000-0003-4523-9624 | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.identifier.doi | 10.1117/1.JMM.21.4.044601 | |
dc.source.numberofpages | 14 | |
dc.source.peerreview | yes | |
dc.subject.discipline | Materials science | |
dc.source.beginpage | 1 | |
dc.source.endpage | 14 | |
dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
dc.source.issue | 4 | |
dc.source.volume | 21 | |
imec.availability | Under review |
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