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A Novel Ni-Al Alloy Metal Induced Lateral Crystallization Process for Improved Channel Conduction in 3-D NAND Flash

dc.contributor.authorRamesh, S.
dc.contributor.authorBanerjee, K.
dc.contributor.authorOpsomer, K.
dc.contributor.authorRachita, I
dc.contributor.authorBastos, J. P.
dc.contributor.authorSoulie, J-Ph
dc.contributor.authorSebaai, F.
dc.contributor.authorFavia, P.
dc.contributor.authorKorytov, M.
dc.contributor.authorRichard, O.
dc.contributor.authorBreuil, L.
dc.contributor.authorArreghini, A.
dc.contributor.authorVan den Bosch, G.
dc.contributor.authorRosmeulen, M.
dc.date.accessioned2023-03-02T03:30:59Z
dc.date.available2023-03-02T03:30:59Z
dc.date.issued2022-DEC
dc.identifier.issn0741-3106
dc.identifier.otherWOS:000924865400019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41213
dc.sourceWOS
dc.titleA Novel Ni-Al Alloy Metal Induced Lateral Crystallization Process for Improved Channel Conduction in 3-D NAND Flash
dc.typeJournal article
dc.contributor.imecauthorRamesh, S.
dc.contributor.imecauthorBanerjee, K.
dc.contributor.imecauthorOpsomer, K.
dc.contributor.imecauthorRachita, I
dc.contributor.imecauthorBastos, J. P.
dc.contributor.imecauthorSoulie, J-Ph
dc.contributor.imecauthorSebaai, F.
dc.contributor.imecauthorFavia, P.
dc.contributor.imecauthorKorytov, M.
dc.contributor.imecauthorRichard, O.
dc.contributor.imecauthorBreuil, L.
dc.contributor.imecauthorArreghini, A.
dc.contributor.imecauthorVan den Bosch, G.
dc.contributor.imecauthorRosmeulen, M.
dc.identifier.doi10.1109/LED.2022.3212105
dc.source.numberofpages4
dc.source.peerreviewyes
dc.source.beginpage2085
dc.source.endpage2088
dc.source.journalIEEE ELECTRON DEVICE LETTERS
dc.source.issue12
dc.source.volume43
imec.availabilityUnder review


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220.500.12860/41213.22023-04-25T09:15:09Zvalidation by library/open access desk
120.500.12860/41213*2023-03-02T03:30:59Z

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