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HAXPES on SiO2 with Ga Ka photons

dc.contributor.authorVanleenhove, Anja
dc.contributor.authorMascarenhas, Fiona Crystal
dc.contributor.authorHoflijk, Ilse
dc.contributor.authorVaesen, Inge
dc.contributor.authorZborowski, Charlotte
dc.contributor.authorConard, Thierry
dc.date.accessioned2023-05-04T09:07:15Z
dc.date.available2023-05-04T09:07:15Z
dc.date.issued2022
dc.identifier.issn1055-5269
dc.identifier.otherWOS:000810225500001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41535
dc.sourceWOS
dc.titleHAXPES on SiO2 with Ga Ka photons
dc.typeJournal article
dc.contributor.imecauthorVanleenhove, Anja
dc.contributor.imecauthorMascarenhas, Fiona Crystal
dc.contributor.imecauthorHoflijk, Ilse
dc.contributor.imecauthorVaesen, Inge
dc.contributor.imecauthorZborowski, Charlotte
dc.contributor.imecauthorConard, Thierry
dc.contributor.orcidimecZborowski, Charlotte::0000-0001-6276-7109
dc.contributor.orcidimecVaesen, Inge::0000-0003-3533-4679
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVanleenhove, Anja::0000-0001-5481-9642
dc.contributor.orcidimecMascarenhas, Fiona Crystal::0000-0002-5849-6630
dc.date.embargo2023-04-29
dc.identifier.doi10.1116/6.0001523
dc.source.numberofpages7
dc.source.peerreviewyes
dc.source.beginpageArt. 014012
dc.source.endpagena
dc.source.journalSURFACE SCIENCE SPECTRA
dc.source.issue1
dc.source.volume29
imec.availabilityPublished - open access
dc.description.wosFundingTextWe are grateful to the Research Foundation Flanders (FWO) for funding the HAXPES Lab instrument within the HERCULES program for Large Research Infrastructure of the Flemish government. Project I014018N.


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