dc.contributor.author | Clerix, Jan-Willem | |
dc.contributor.author | Warad, L. | |
dc.contributor.author | Hung, J. | |
dc.contributor.author | Hody, Hubert | |
dc.contributor.author | Van Roey, Frieda | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | Koret, R. | |
dc.contributor.author | Lee, W. T. | |
dc.contributor.author | Shah, K. | |
dc.contributor.author | Delabie, Annelies | |
dc.date.accessioned | 2023-07-12T20:56:39Z | |
dc.date.available | 2023-05-22T20:15:46Z | |
dc.date.available | 2023-07-12T20:56:39Z | |
dc.date.issued | 2023 | |
dc.identifier.issn | 0169-4332 | |
dc.identifier.other | WOS:000984767300001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41611.2 | |
dc.source | WOS | |
dc.title | 300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition | |
dc.type | Journal article | |
dc.contributor.imecauthor | Clerix, Jan-Willem | |
dc.contributor.imecauthor | Hody, Hubert | |
dc.contributor.imecauthor | Van Roey, Frieda | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.orcidimec | Clerix, Jan-Willem::0000-0002-2681-4569 | |
dc.contributor.orcidimec | Delabie, Annelies::0000-0001-9739-7419 | |
dc.identifier.doi | 10.1016/j.apsusc.2023.157222 | |
dc.source.numberofpages | 10 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 157222 | |
dc.source.endpage | na | |
dc.source.journal | APPLIED SURFACE SCIENCE | |
dc.source.issue | July | |
dc.source.volume | 626 | |
imec.availability | Published - imec | |