dc.contributor.author | Duflou, Rutger | |
dc.contributor.author | Pourtois, Geoffrey | |
dc.contributor.author | Houssa, Michel | |
dc.contributor.author | Afzalian, Aryan | |
dc.date.accessioned | 2023-07-12T16:03:36Z | |
dc.date.available | 2023-06-10T20:06:20Z | |
dc.date.available | 2023-06-14T12:15:10Z | |
dc.date.available | 2023-07-12T16:03:36Z | |
dc.date.issued | 2023-05-31 | |
dc.identifier.issn | 2397-7132 | |
dc.identifier.other | WOS:000998448000001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41704.3 | |
dc.source | WOS | |
dc.title | Fundamentals of low-resistive 2D-semiconductor metal contacts: an ab-initio NEGF study | |
dc.type | Journal article | |
dc.contributor.imecauthor | Duflou, Rutger | |
dc.contributor.imecauthor | Pourtois, Geoffrey | |
dc.contributor.imecauthor | Houssa, Michel | |
dc.contributor.imecauthor | Afzalian, Aryan | |
dc.contributor.orcidimec | Duflou, Rutger::0000-0002-0357-1293 | |
dc.contributor.orcidimec | Pourtois, Geoffrey::0000-0003-2597-8534 | |
dc.contributor.orcidimec | Houssa, Michel::0000-0003-1844-3515 | |
dc.contributor.orcidimec | Afzalian, Aryan::0000-0002-5260-0281 | |
dc.date.embargo | 2023-05-31 | |
dc.identifier.doi | 10.1038/s41699-023-00402-3 | |
dc.source.numberofpages | 13 | |
dc.source.peerreview | yes | |
dc.subject.discipline | Materials science | |
dc.source.beginpage | 1 | |
dc.source.endpage | 13 | |
dc.source.journal | NPJ 2D MATERIALS AND APPLICATIONS | |
dc.source.issue | 1 | |
dc.source.volume | 7 | |
imec.availability | Published - open access | |
dc.description.wosFundingText | AcknowledgementsThis research was funded by the FWO as part of the PhD fellowship 1100321N. A.A. thanks Dr. Gouri Sankar Kar and Dr. Cesar Javier Lockhart de la Rosa for management support. R.D. acknowledges the support of Michiel van Setten, Sergiu Clima, Christopher Pashartis, Kiroubanand Sankaran, Albert de Jamblinne de Meux, and Benoit Van Troeye related to advice on the DFT simulations and the use of their simulation scheduler toolkit. | |