dc.contributor.author | Peter, Antony | |
dc.contributor.author | Sepulveda Marquez, Alfonso | |
dc.contributor.author | Meersschaut, Johan | |
dc.contributor.author | Dara, Praveen | |
dc.contributor.author | Blanquart, Timothee | |
dc.contributor.author | Tomomi, Takayama | |
dc.contributor.author | Taishi, Ebisudani | |
dc.contributor.author | Elichiro, Shiba | |
dc.contributor.author | Kimura, Yosuke | |
dc.contributor.author | Van Gompel, Sander | |
dc.contributor.author | Morin, Pierre | |
dc.date.accessioned | 2023-08-07T10:08:31Z | |
dc.date.available | 2023-06-20T10:33:28Z | |
dc.date.available | 2023-08-07T10:08:31Z | |
dc.date.issued | 2022 | |
dc.identifier.issn | 2166-2746 | |
dc.identifier.other | WOS:000835557000002 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41810.2 | |
dc.source | WOS | |
dc.title | Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films | |
dc.type | Journal article | |
dc.contributor.imecauthor | Peter, Antony | |
dc.contributor.imecauthor | Sepulveda Marquez, Alfonso | |
dc.contributor.imecauthor | Meersschaut, Johan | |
dc.contributor.imecauthor | Dara, Praveen | |
dc.contributor.imecauthor | Kimura, Yosuke | |
dc.contributor.imecauthor | Van Gompel, Sander | |
dc.contributor.imecauthor | Morin, Pierre | |
dc.contributor.orcidimec | Dara, Praveen::0000-0002-2334-3976 | |
dc.contributor.orcidimec | Kimura, Yosuke::0000-0002-3876-9363 | |
dc.contributor.orcidimec | Meersschaut, Johan::0000-0003-2467-1784 | |
dc.contributor.orcidimec | Kimura, Yosuke::0000-0002-9098-0414 | |
dc.contributor.orcidimec | Morin, Pierre::0000-0002-4637-496X | |
dc.contributor.orcidimec | Peter, Antony::0000-0001-5941-0563 | |
dc.contributor.orcidimec | Sepulveda Marquez, Alfonso::0000-0003-4726-177X | |
dc.date.embargo | 9999-12-31 | |
dc.identifier.doi | 10.1116/6.0001922 | |
dc.source.numberofpages | 11 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 054001 | |
dc.source.endpage | na | |
dc.source.journal | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | |
dc.source.issue | 5 | |
dc.source.volume | 40 | |
imec.availability | Published - imec | |