dc.contributor.author | Degraeve, Robin | |
dc.contributor.author | Kaczer, Ben | |
dc.contributor.author | Groeseneken, Guido | |
dc.date.accessioned | 2021-10-14T12:51:44Z | |
dc.date.available | 2021-10-14T12:51:44Z | |
dc.date.issued | 2000 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4302 | |
dc.source | IIOimport | |
dc.title | Reliability: a possible showstopper for oxide thickness scaling? | |
dc.type | Journal article | |
dc.contributor.imecauthor | Degraeve, Robin | |
dc.contributor.imecauthor | Kaczer, Ben | |
dc.contributor.imecauthor | Groeseneken, Guido | |
dc.contributor.orcidimec | Kaczer, Ben::0000-0002-1484-4007 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 436 | |
dc.source.endpage | 444 | |
dc.source.journal | Semiconductor Science and Technology | |
dc.source.issue | 5 | |
dc.source.volume | 15 | |
imec.availability | Published - open access | |