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Silicon surface texturing by reactive ion etching

dc.contributor.authorDekkers, Harold
dc.contributor.authorDuerinckx, Filip
dc.contributor.authorSzlufcik, Jozef
dc.contributor.authorNijs, Johan
dc.date.accessioned2021-10-14T12:51:59Z
dc.date.available2021-10-14T12:51:59Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4305
dc.sourceIIOimport
dc.titleSilicon surface texturing by reactive ion etching
dc.typeJournal article
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorDuerinckx, Filip
dc.contributor.imecauthorSzlufcik, Jozef
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecDuerinckx, Filip::0000-0003-2570-7371
dc.source.peerreviewno
dc.source.beginpage311
dc.source.endpage316
dc.source.journalOpto-Electronics Review
dc.source.issue4
dc.source.volume8
imec.availabilityPublished - imec


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