dc.contributor.author | Lorusso, Gian | |
dc.date.accessioned | 2024-04-25T14:46:22Z | |
dc.date.available | 2024-01-09T17:15:04Z | |
dc.date.available | 2024-04-25T14:46:22Z | |
dc.date.issued | 2023 | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:001122013000011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43370.2 | |
dc.source | WOS | |
dc.title | Unavoidable renaissance of electron metrology in the age of high numerical aperture extreme ultraviolet lithography | |
dc.type | Journal article | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.orcidimec | Lorusso, Gian::0000-0003-3498-5082 | |
dc.identifier.doi | 10.1117/1.JMM.22.2.021005 | |
dc.source.numberofpages | 10 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 021005 | |
dc.source.endpage | N/A | |
dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
dc.source.issue | 2 | |
dc.source.volume | 22 | |
imec.availability | Published - imec | |