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Articles
Unavoidable renaissance of electron metrology in the age of high numerical aperture extreme ultraviolet lithography
Publication:
Unavoidable renaissance of electron metrology in the age of high numerical aperture extreme ultraviolet lithography
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Date
2023
Journal article
https://doi.org/10.1117/1.JMM.22.2.021005
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lorusso, Gian
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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804
since deposited on 2024-01-09
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Acq. date: 2025-12-17
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Views
804
since deposited on 2024-01-09
2
last month
1
last week
Acq. date: 2025-12-17
Citations