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A study of high NA EUV pattern stitching using rigorous stochastic lithography simulation

dc.contributor.authorRobertson, Stewart
dc.contributor.authorSchramm, Robert
dc.contributor.authorPret, Alessandro Vaglio
dc.contributor.authorWiaux, Vincent
dc.date.accessioned2024-02-05T13:31:03Z
dc.date.available2024-01-13T17:47:50Z
dc.date.available2024-02-05T13:31:03Z
dc.date.issued2023
dc.identifier.isbn978-1-5106-6748-8
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001125089900002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43406.2
dc.sourceWOS
dc.titleA study of high NA EUV pattern stitching using rigorous stochastic lithography simulation
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.orcidimecWiaux, Vincent::0000-0002-8923-5708
dc.identifier.doi10.1117/12.2688230
dc.identifier.eisbn978-1-5106-6749-5
dc.source.numberofpages8
dc.source.peerreviewyes
dc.source.beginpageArt. 1275003
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateOCT 02-05, 2023
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.volume12750
imec.availabilityPublished - imec


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